Pulse Laser Film Formation Device "GLAZE Series"
Substrate heating above 800℃ and reactive film formation are possible! A pulsed laser deposition system that enables high-efficiency and high-quality film formation.
The "GLAZE Series" is a state-of-the-art pulsed laser deposition system for thin film formation. It enables high-efficiency and high-quality film deposition through a hybrid process. It allows for substrate heating above 800°C and reactive film deposition, and it can also be equipped with a magnetron cathode. 【Features】 ■ State-of-the-art pulsed laser deposition system for thin film formation ■ High-efficiency and high-quality film deposition through a hybrid process ■ Substrate heating above 800°C and reactive film deposition possible ■ Magnetron cathode can also be installed *For more details, please refer to the PDF document or feel free to contact us.
- Company：ハイテック・システムズ
- Price：Other
